Ion Implantation and Activation

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Preface

Author(s): Kunihiro Suzuki

Pp: i-ii (2)

DOI: 10.2174/9781608057924113030001

Cite as

Frontiers in Ceramic Science

Fundamentals of Materials Engineering- A Basic Guide

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Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications

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DOI https://doi.org/10.2174/9781608057924113030001	Print ISSN 2589-2940
Publisher Name Bentham Science Publisher	Online ISSN 2215-0005