Abstract
A few lithography techniques have been developed in the past few decades
with improvements in lens systems and advanced radiation sources for exposure, such
as photons, X-rays, electrons, ions, and neutral atoms. With each type of exposure
source, the instrumental details significantly change. However, the fundamental
principle behind the lithographic approaches remains the same. Photolithography is
the most intensive technique in microelectronic fabrication, especially for the bulk
production of integrated circuits (ICs). Below the different types of lithography
techniques are described in detail.
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