Abstract
This chapter introduces the readers to the diffusion process of doping
intrinsic silicon. It discusses Fick’s Law of diffusion in-depth and the different types
of diffusion that may be observed. Towards the latter part of the chapter, the diffusion
process in semiconductors has been discussed in detail, explaining the diffusion-assisted doping process commonly employed for semiconductors, especially silicon
About this chapter
Cite this chapter as:
Sunipa Roy, Chandan Kumar Ghosh, Sayan Dey, Abhijit Kumar Pal ;Diffusion, Solid State & Microelectronics Technology (2023) 1: 322. https://doi.org/10.2174/9789815079876123010010
DOI https://doi.org/10.2174/9789815079876123010010 |
Publisher Name Bentham Science Publisher |