Abstract
An in situ method of strain characterization based on image analysis of atomic force microscope images is presented. The sample topographic image is measured before and after deformation using an atomic force microscope with closed loop feedback control of position. By using a mapping function for each point in the image and performing a correlation using the height data, the displacement, strain and strain gradient can be deduced. The digital image correlation algorithm is most suitable for microelectromechanical materials and devices.
Keywords: X-rays, Synchrotron, Beamline, Microdiffraction, Bragg law, Reciprocal space, Electromigration.
Related Books
Image Processing for Embedded Devices
Bipolar Transistor and MOSFET Device Models
Design of Analog Circuits through Symbolic Analysis
Electromagnetic Interference Issues in Power Electronics and Power Systems
Electromagnetics for Engineering Students Part I
Electromagnetics for Engineering Students (Part II)
Fiber Bragg Grating Sensors: Recent Advancements, Industrial Applications and Market Exploitation
Frontiers in Electrical Engineering
Modern Intelligent Instruments - Theory and Application
Photonic Bandgap Structures Novel Technological Platforms for Physical, Chemical and Biological Sensing