Abstract
Quantum well devices based on III-V heterostructures outperform Field
Effect Transistors (FETs) by harnessing the exceptional properties of the twodimensional electron gas (2DEG) in various material interface systems. In high-power
electronics, III-V-based Gallium Nitride (GaN) HEMTs can have a great influence on
the transport industry, consumer, RADAR, sensing systems, RF/ power electronics, and
military systems. On the other hand, the devices made of HEMTs and MIS-HEMTs
work in enhancement mode, having very low leakage current, which can conserve
energy for more efficient power conversion, microwave/ power transistors and highspeed performance for wireless communication. The existing physics of the wellestablished AlGaN heterostructure system imposes constraints on the further progress
of GaN-based HEMTs. Some of the scopes include: Initially, the semiconductor
materials made of SiC, GaN, and AlGaN allow a device that is resistant to severe
conditions, such as high-power /voltage-high temperature, to operate due to its
effective dielectric constant and has a very good thermal conductivity, which makes
this device well-suited for military applications. Secondly, with the urgent need for
high-speed internet multimedia communication across the world, high transmission
network capacity is required. GaN-based HEMT devices are suitable candidates for
achieving high-speed limits, high gain and low noise performance. In conclusion, GaN
and related interface materials exhibit chemical stability and act as robust
semiconductors, exhibiting remarkable piezoelectric polarization effects that lead to a
high-quality 2DEG. Integrating free-standing resonators with functionalized GaNbased 2DEG formation reveals the potential for designing advanced sensors.