Abstract
In this work, we investigated the effect of film thickness on the structure and
properties of Ti-N films deposited by magnetron sputtering. The structural properties of
Ti-N films were described, followed by a detailed investigation into their mechanical
properties by using theoretical and experimental analysis. The theoretical calculation
presented the Rocksalt TiN structure with a lattice parameter of about 4.255 Å,
confirmed by X-ray diffraction. The experimental analysis revealed that the structure
and the hardness of TiN films varied in a wide range when increasing the film
thickness. The structure morphology also changed from a rough to a dense surface and
a smooth structure. The hardness and Young modulus of the TiN film reach maximum
values of about 26 GPa and 445 GPa, respectively, and then decrease with increasing
the film’s thickness. The theoretical values of the hardness and young modulus are in
excellent agreement with those obtained for the Ti-N thick films.
Related Books
Advances in Additive Manufacturing Processes
Advances in Manufacturing Technologies and Production Engineering
Advances in Nonconventional Machining Processes
Global Emerging Innovation Summit (GEIS-2021)
Industrial Applications of Laser Remote Sensing
Lean Management Solutions for Contemporary Manufacturing Operations
Prepare Yourself For the Professional Practice Examination
Safety Science: Methods to Prevent Incidents and Worker Health Damage at the Workplace
Soft Robotics
Facets of a Smart City: Computational and Experimental Techniques for Sustainable Urban Development