Search Result "plasma-enhanced chemical vapor deposition (PECVD)"


Deposition of Thin Films: PECVD Process

Ebook: Silicon Based Thin Film Solar Cells
Volume: 1 Year: 2013
Author(s): Armando Menéndez,Pascal Sánchez,David Gómez
Doi: 10.2174/9781608055180113010006

Recent Advances in Chemical Vapor Deposition

Journal: Current Organic Chemistry
Volume: 10 Issue: 9 Year: 2006 Page: 1021-1033
Author(s): Bradley D. Fahlman

An Overview of Selected Catalytic Chemical Vapor Deposition Parameter for Aligned Carbon Nanotube Growth

Journal: Nanoscience & Nanotechnology-Asia
Volume: 4 Issue: 1 Year: 2014 Page: 2-30
Author(s): Mohd. Shahril Amin Bistamam,Mohd. Asyadi Azam,Nor Syafira Abdul Manaf,Pei Sean Goh,Mohd. Warikh Abdul Rashid,Ahmad Fauzi Ismail

Review Article

Thermal Interface Materials Based on Vertically Aligned Carbon Nanotube Arrays: A Review

Journal: Micro and Nanosystems
Volume: 11 Issue: 1 Year: 2019 Page: 3-10
Author(s): Guangjie Yuan,Haohao Li,Bo Shan,Johan Liu

Methods for the Synthesis of Carbon Nanotubes

Ebook: Current and Future Developments in Nanomaterials and Carbon Nanotubes
Volume: 1 Year: 2018
Author(s): Jagjiwan Mittal
Doi: 10.2174/9781681085951118010005

Micromorph Cells

Ebook: Silicon Based Thin Film Solar Cells
Volume: 1 Year: 2013
Author(s): Maurizio Acciarri
Doi: 10.2174/9781608055180113010014

Layer Protecting the Surface of Zirconium Used in Nuclear Reactors

Journal: Recent Patents on Nanotechnology
Volume: 10 Issue: 1 Year: 2016 Page: 59-65
Author(s):

Recent Developments and Patents on Thin Film Technology

Journal: Recent Patents on Materials Science
Volume: 1 Issue: 3 Year: 2008 Page: 200-208
Author(s): Ioanna Giouroudi, Jurgen Kosel, Cornie Scheffer

Cobalt Catalyzed Carbon Nanotube Growth on Graphitic Paper Supports

Journal: Current Nanoscience
Volume: 7 Issue: 3 Year: 2011 Page: 315-322
Author(s): V. Engels, J. Geng, G. M. Jones, J. A. Elliott, A. E.H. Wheatley, S. R. Boss

Properties of Oxynitride Thin Films for Biomedical Applications

Ebook: Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications
Volume: 1 Year: 2013
Author(s): Martin Fenker
Doi: 10.2174/9781608051564113010014

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