Search Result "Low Pressure Chemical Vapor Deposition"
Recent Advances in Chemical Vapor Deposition
Journal: Current Organic Chemistry
Volume: 10 Issue: 9 Year: 2006 Page: 1021-1033
Author(s): Bradley D. Fahlman
Characterization and Field Emission Studies of Uniformly Distributed Multi-Walled Carbon Nanotubes (MWCNTs) Film Grown by Low-pressure Chemical Vapour Deposition (LPCVD)
Journal: Current Nanoscience
Volume: 7 Issue: 3 Year: 2011 Page: 333-336
Author(s): Javid Ali, Avshish Kumar, Samina Husain, Monika Kumari, Harsh, Mushahid Husain
Deposition of Thin Films: PECVD Process
Ebook: Silicon Based Thin Film Solar Cells
Volume: 1 Year: 2013
Author(s): Armando Menéndez,Pascal Sánchez,David Gómez
Doi: 10.2174/9781608055180113010006
A Recent Patent on Microwave Plasma Chemical Vapor-Deposited Diamond Film on Cutting Tools
Journal: Recent Patents on Mechanical Engineering
Volume: 10 Issue: 2 Year: 2017 Page: 140-143
Author(s): Zhang Ling,Kong Dejun
HW-CVD Deposited Nanocrystalline Silicon Thin Films at Low Substrate Temperature with White-Blue Luminescence
Journal: Current Nanoscience
Volume: 11 Issue: 5 Year: 2015 Page: 621-626
Author(s): A. Dutt,S. Godavarthi,Y. Matsumoto,G. Santana-Rodriguez,A. Avila,V. Sanchez,G. Raina
An Overview of Selected Catalytic Chemical Vapor Deposition Parameter for Aligned Carbon Nanotube Growth
Journal: Nanoscience & Nanotechnology-Asia
Volume: 4 Issue: 1 Year: 2014 Page: 2-30
Author(s): Mohd. Shahril Amin Bistamam,Mohd. Asyadi Azam,Nor Syafira Abdul Manaf,Pei Sean Goh,Mohd. Warikh Abdul Rashid,Ahmad Fauzi Ismail
Liquid and Solid Precursor Delivery Systems in Gas Phase Processes
Journal: Recent Patents on Materials Science
Volume: 8 Issue: 2 Year: 2015 Page: 91-108
Author(s): Constantin Vahlas,Brigitte Caussat,Wayne L. Gladfelter,François Senocq,Elizabeth J. Gladfelter
Role of Deposition Pressure on Properties of Phosphorus Doped Hydrogenated Nano-Crystalline Silicon (nc-Si:H) Thin Films Prepared by the Cat-CVD Method
Journal: Recent Innovations in Chemical Engineering
Volume: 14 Issue: 1 Year: 2021 Page: 46-57
Author(s): Bharat Gabhale,Ashish Waghmare,Subhash Pandharkar,Ajinkya Bhorde,Shruthi Nair,Priti Vairale,Vidya Doiphode,Pratibha Shinde,Ashvini Punde,Yogesh Hase,Nilesh Patil,Mohit Prasad,Sandesh Jadkar
Deposition of Ni/TiN Composite Coatings by a Plasma Assisted MOCVD Using an Organometallic Precursor
Journal: Micro and Nanosystems
Volume: 4 Issue: 3 Year: 2012 Page: 199-207
Author(s): S. Arockiasamy,T. Maiyalagan,P. Kuppusami,C. Mallika,K.S. Nagaraja
Abrupt Change on the Wettability of Vapor-Deposited Thin Silane Film Upon Evaporative Drying and Annealing
Journal: Current Nanoscience
Volume: 7 Issue: 3 Year: 2011 Page: 489-496
Author(s): Hwa Seng Khoo, Tsu-Wei Huang, Fan-Gang Tseng