Search Result "COSMETIC USE"
Use of Fullerenes in Cosmetics
Journal: Recent Patents on Biotechnology
Volume: 3 Issue: 2 Year: 2009 Page: 118-123
Author(s): Marko Lens
Industrial Uses of MAPs: Cosmetic Industry
Ebook: Frontiers in Horticulture
Volume: 1 Year: 2017
Author(s): M. Paz Arraiza,Carlos Calderon-Guerrero,Silvia C. Guillen,Miguel A. Sarmiento
Doi: 10.2174/9781681085500117010006
Medicinal and Cosmetic Potentials of Sophorolipids
Journal: Mini-Reviews in Medicinal Chemistry
Volume: 13 Issue: 1 Year: 2013 Page: 1761-1768
Author(s): V.K. Morya, Changha Ahn, Sanggui Jeon, Eun-Ki Kim
Regulations of Cosmetics Across the Globe
Journal: Applied Clinical Research, Clinical Trials and Regulatory Affairs (Discontinued)
Volume: 2 Issue: 3 Year: 2015 Page: 137-144
Author(s): Shivaji Rai,Apeksha Gupta,Vikas Punetha
Emerging Role of Microemulsions in Cosmetics
Journal: Recent Patents on Drug Delivery & Formulation
Volume: 2 Issue: 3 Year: 2008 Page: 275-289
Author(s): Adnan Azeem, Mohammad Rizwan, Farhan J. Ahmad, Zeenat I. Khan, Roop K. Khar, Mohammed Aqil, Sushama Talegaonkar
Nanostructures for Cosmetics and Medicine
Ebook: Synthesis and Applications of Semiconductor Nanostructures
Volume: 4 Year: 2023
Author(s):
Doi: 10.2174/9789815080117123040014
Nanomaterials in Cosmetics: Regulatory, Quality & Safety Assessment
Journal: Applied Clinical Research, Clinical Trials and Regulatory Affairs
Volume: 4 Issue: 2 Year: 2017 Page: 99-106
Author(s): Poonam Kumari,Deepti Pandita,Neelam Poonia,Viney Lather
Exploring the Application of Artificial Intelligence in Cosmetics andBeauty Industry
Journal: Current Cosmetic Science
Volume: 3 Issue: 0 Year: 2024 Page: 1-9
Author(s):
How to Choose the Best Fragrance for Your Cosmetics
Journal: Current Cosmetic Science
Volume: 2 Issue: 1 Year: 2023 Page: 144-149
Author(s):
A Review on Common Ingredients of Periocular Cosmetics and Their Hazards
Journal: Current Organic Chemistry
Volume: 19 Issue: 1 Year: 2015 Page: 30-38
Author(s): Karen Tang,Shu-Yi Lu,Dik-Lung Ma,Chung-Hang Leung,Su-Shin Lee,Shi-Wei Lin,Hui-Min D. Wang