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Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Ebook: Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications
Volume: 1 Year: 2013
Author(s): Saïd Agouram,Guy Terwagne,Franz Bodart
Doi: 10.2174/9781608051564113010010

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