[1]
McIntyre, R.J. Multiplication noise in uniform avalanche diodes. IEEE Trans. Electron Dev., 1966, 13, 164-168.
[2]
Othman, M.A.; Taib, S.N.; Husain, M.N.; Napiah, Z.A.F.M. Reviews on avalanche photodiode for optical communication technology. ARPN J. Eng. Appl. Sci., 2004, 9(1), 35-44.
[3]
Teich, M.C.; Matsuo, K.; Saleh, B.E.A. Excess noise factors for conventional and supperlattice avalanche photodiodes and photomultiplier tube. IEEE J. Quantum Electron., 1996, 22(8), 1184-1193.
[4]
Brennan, K.F.; Haralson, J. Superlattice and multiquantum well avalanche photodetectors: Physics, concepts and performance. Superlattices Microstruct., 2000, 28(2), 77-104.
[5]
Acharyya, A.; Ghosh, S. Dark current reduction in nano-avalanche photodiodes by incorporating multiple quantum barriers. Int. J. Electron., 2017, 104(12), 1957-1973.
[6]
Ghosh, S.; Charyya, A. Multiple quantum barrier nano-avalanche photodiodes – Part I: Spectral response. Nanosci. Nanotechnol. Asia, 2019. [EPub ahead of Print].
[7]
Arthur, J.R. Molecular beam epitaxy. Surf. Sci., 2002, 500(1-3), 189-217.
[8]
Vyas, H.P.; Gutmann, R.J.; Borrego, J.M. Effect of hole versus electron photocurrent on microwave-optical interactions in Impatt oscillators. IEEE Trans. Electron Dev., 1979, 26(3), 232-234.
[9]
Capasso, F.; Tsang, W.T.; Williams, G.F. Staircase solid-state photomultiplier and avalanche photodiodes with enhanced ionization rates ratio. IEEE Trans. Electron Dev., 1983, 30(4), 381-390.
[10]
Grant, W.N. Electron and hole ionization rates in epitaxial Silicon. Solid-State Electron., 1973, 16, 1189-1203.
[11]
Bellotti, E.; Nilsson, H.E.; Brennan, K.F.; Ruden, P.P. Ensemble Monte Carlo calculation of hole transport in bulk 3C-SiC. J. Appl. Phys., 1999, 85(6), 3211-3217.
[12]
Mickevicius, R.; Zhao, J.H. Monte Carlo study of electron transport in SiC. J. Appl. Phys., 1998, 83(6), 3161-3167.
[13]
Chin, R.; Holonyak, N.; Stillman, G.E.; Tang, J.Y.; Hess, K. Impact ionisation in multilayered heterojunction structures. Electron. Lett., 1980, 16(12), 467-468.
[14]
Shichuo, H.; Kolbas, R.M.; Holonyak, N.; Dupuis, R.D.; Dapkus, P.D. Carrier collection in a semiconductor quantum well. Solid State Commun., 1978, 27, 1029-1032.
[15]
Holonyak, N.; Kolbas, R.M.; Dupuis, R.D.; Dapkus, P.D. Quantum-well heterostructure lasers. IEEE J. Quantum Electron., 1980, 16, 170-186.
[16]
van Vliet, K.M.; Friedmann, A.; Rucker, L.M. Theory of carrier multiplication and noise in avalanche devices - Part II: Two-carrier processes. IEEE Trans. Electron Dev., 1979, 26, 752-764.
[17]
Rajkanan, K.; Singh, R.; Shewchun, J. Absorption coefficient of silicon for solar cell calculations. Solid-State Electron., 1979, 22(9), 793-795.
[18]
Spitzer, W.; Fan, H.Y. Infrared absorption in n-type silicon. Phys. Rev., 1957, 108(2), 268-271.
[19]
Hara, H.; Nishi, Y. Free Carrier absorption in p-type silicon. J. Phys. Soc. Jpn., 1966, 21(6), 1222.
[20]
Solangi, A.; Chaudry, M.I. Absorption coefficient of beta--SiC grown by chemical vapor deposition. J. Mater. Res., 1992, 7, 539-541.
[21]
Mukherjee, K.; Das, N.R. Absorption coefficient in a MQW intersubband photodetector with non-uniform doping density & layer distribution. Prog. Electromagn. Res. M, 2014, 38, 193-201.
[22]
Manasreh, O. Semiconductor Heterojunctions and Nanostructures; McGraw-Hill: New York, 2005, pp. 210-216.
[23]
Canali, C.; Ottaviani, G.; Quaranta, A.A. Drift velocity of electrons and holes and associated anisotropic effects in silicon. J. Phys. Chem. Solids, 1971, 32, 1707-1720.
[25]
Zeghbroeck, B.V. Principles of Semiconductor Devices; Colorado Press: USA, 2011.
[26]
May, C.P. Impact ionization rate calculations for device simulation; ETH, Eidgenössische Technische Hochschule Zürich, Integrated
Systems Laboratory. , 2005.
[27]
Yan-Kun, D.; Xin, Q.; Hai-Bo, J.; Mao-Sheng, C.; Zahid, U.; Zhi-Ling, H. First principle study of the electronic properties of 3C-SiC doped with different amounts of Ni. Chin. Phys. Lett., 2012, 29(7), 077701-1-4.