Structural, Optical and Electrical Properties of p-CuS:Cu⁺and n-CuS:Sn⁴⁺ Films Deposited with a Chemical Bath Deposition

Title:Structural, Optical and Electrical Properties of p-CuS:Cu⁺and n-CuS:Sn⁴⁺ Films Deposited with a Chemical Bath Deposition

Volume: 9 Issue: 2

Author(s): Haiyan He, Jianfeng Huang, Jie Fei and Jing Lu

Affiliation:

Keywords: A. semiconductors, A. nanostructures, D. electrical properties, D. optical properties.

Abstract: This work presents the manufacturing and potential application of the CuS films in recent literature and patents and then focus on the chemical bath depostion of p-CuS: Cu⁺and n-CuS: Sn⁴⁺ filmsat room temperature by controlling S/Cu molar ratio in the bath solution and doping Cu⁺ and Sn⁴⁺ cations, respectively. The CuS:Cu⁺and CuS:Sn⁴⁺ films with S/Cu molar ratio larger and less than the stoichiometric ratio showed p-type and n-type electrical conduction, respectively, and low electrical resistivity of~1.31×10^-3 Ω·cm and ~0.73-0.80×10^-3 Ω·cm, respectively. Moreover, the films had the average transmittance of ~20.1-30.1 % in 290-1100 nm. The direct allowed band gaps and indirect allowed optical band gap energies of the films were estimated to be in the ranges of ~2.58-2.63 eV and ~1.6-1.78 eV, respectively. The extinction coefficient, refractive index, dielectric constant, and optical conductivity of the films were calculated with the transmittance and reflectance spectra.

Cite this article as:

He Haiyan, Huang Jianfeng, Fei Jie and Lu Jing, Structural, Optical and Electrical Properties of p-CuS:Cu⁺and n-CuS:Sn⁴⁺ Films Deposited with a Chemical Bath Deposition, Recent Patents on Nanotechnology 2015; 9 (2) . https://dx.doi.org/10.2174/187221050902150819152437