Application of Supercritical Fluid in Nanolithographic Processes

Title: Application of Supercritical Fluid in Nanolithographic Processes

Volume: 4 Issue: 2

Author(s): Jijie Zhou

Affiliation:

Keywords: Critical point drying, supercritical fluid treatment, nanostructures, nanoarrays, nanolithography

Abstract: The supercritical state provides an energetic environment in which high-aspect-ratio or active surface structures can be reacted, swelled, cleaned, or coated. Due to both low viscosity and low interfacial tension, reagent, solvent, rinsing and drying media of supercritical fluids can be efficiently delivered into the nanointerstices of a substrate. This article summarizes recent patents in the field of using supercritical fluids in nanolithographic processing methods such as drying, removal of lithographic resist, and formation of hybrid structures. Some of our recent efforts on restoring the collapsed on-chip nanotube arrays, and synthesizing zeolite-polymer hybrid membrane materials are exemplified as applications of supercritical fluids. Introducing supercritical effects may guide sustainable technologies for the development of green processes.

Cite this article as:

Zhou Jijie, Application of Supercritical Fluid in Nanolithographic Processes, Recent Patents on Nanotechnology 2010; 4 (2) . https://dx.doi.org/10.2174/187221010791208849