Abstract
Nanomechanical response of indented aluminum/titanium (Al/Ti) multilayered films were characterized using an Auger electron spectrometer, focused ion beam (FIB) machining, and transmission electron microscopy (TEM). The pure and multilayered films on Si(100) substrates were prepared using the radio frequency magnetron sputtering process. The empirical Hall-Petch relationship and its reverse effect on nanoindentation load-displacement curves, hardness, and Youngs moduli were discovered in individual layers at thicknesses of 28, 14, and 7 nm, respectively. The contributions of atomic sliding grain boundaries and their Al/Ti interfaces were studied. The Hall-Petch effect was seen in thickness of about 3.5 nm for its well blending at such nanometer scale.
Keywords: Multilayer, Hardness, Hall-Petch effect, Size effect, Nanoindentation
Related Books
The Art of Nanomaterials
Advanced Materials and Nano Systems: Theory and Experiment - Part 2
Advanced Materials and Nano Systems: Theory and Experiment (Part-1)
Artificial Intelligence for Smart Cities and Villages: Advanced Technologies, Development, and Challenges
SILVER NANOPARTICLES: Synthesis, Functionalization and Applications
5