Search Result "selflimitingbehavior"


Review Article

Critical Atomic-level Processing Technologies: Remote Plasma-enhanced Atomic Layer Deposition and Atomic Layer Etching

Journal: Micro and Nanosystems
Volume: 10 Issue: 2 Year: 2018 Page: 76-83
Author(s): Guangjie Yuan,Haohao Li,Bo Shan,Johan Liu

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