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Micro and Nanosystems

Editor-in-Chief

ISSN (Print): 1876-4029
ISSN (Online): 1876-4037

Research on Layout Optimization of Obstacles in a Passive Micromixer

Author(s): X. Chen, C. Liu and Z. Xu

Volume 4, Issue 2, 2012

Page: [123 - 127] Pages: 5

DOI: 10.2174/1876402911204020123

Price: $65

Abstract

The paper focuses on optimizing layout of obstacles for enhanced mixing in microchannels. The obstacles can hinder fluid flow and alter the flow direction. In this case, the mixing performance can be achieved further effectively. Three parameters including geometric configuration, layout, and number of obstacles have been studied for analyzing mixing in a ‘T’ channel. In order to facilitate the design, numerical simulations and orthogonal experiment were used to study the effect of three parameters on sensitivity of mixing. The degree of sensitivity using the Taguchi method can be ranked as: asymmetric layout > number of obstacles > geometric configuration. Placing obstacles in the microchannels is an effective method for enhancing mixing and the micromixer with obstacles is relatively easy to produce using standard microfabrication techniques. It can be demonstrated that the results should facilitate the design of microfluidic device.

Keywords: Microfluidic, micromixer, optimization layout, simulation


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