Abstract
The ferroelectric thin film was widely investigated in detail in recent years. The ferroelectric properties of the thin films are obviously dependent on the microstructure of the film, which were influenced by some processing parameters for preparing the films, including precursor solution chemistry, nature of substrate, film thickness, and condition of heat treatment etc. In this paper, these processing dependences of the films are reviewed. The present article discuss some important patents related to ferroelectric thin films.
Keywords: Thin film, ferroelectricity, processing effect, microstructure, orientation
190